 Wet chemical solutions are the preferred
method for etch and cleaning wafers in many semiconductor processes. Wet bench, CMP and hot DI water applications present challenges in an environment that has potential for wafer contamination and process variations that may cause defects and safety concerns. To meet the demands of wet process applications Watlow has developed a family of thermal components for acid, water, CO2, air and solvent applications. Thick film quartz heating technology, because of its fast response, cleanliness and low external temperature is the foundation of what is rapidly becoming the industry's preferred method of heating chemicals. Watlow's UNIVERSAL SOLVENT heater provides NEMA 7 enclosures and redundant cooling systems that can be incorporated for safety. RAPID RESPONSE heat exchangers and STARFLOW air heaters are used to heat gases for cleaning and drying of wafers. These heater and control solutions can be designed and supplied as a critical subsystem for OEM applications.
Related Products
- Thick Film Quartz Heater Modules
- UNIVERSAL SOLVENT Heaters
- STARFLOW Nitrogen (N2) Air Heaters
- RAPID RESPONSE Electric Heat Exchangers
- VERSALINE Heaters
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